מרכיב עיקרי
Hyaluronic Acid, Glycerin, centella, Opuntia
מרכיב
Hyaluronic Acid, Opuntia, Centella, Glycerin
תכונה
קרם לחות, הלבנה, Pore Cleaner, Lightening
מקום מוצא
Guangdong, China
Product Name
Deep Cleaning Bubble Facial Mask
Function
Deep Cleaning, moisturizing
Application
Personal Skin's Care, Face
Key Ingredients
Hyaluronic acid
OEM/ODM
Acceptable MOQ 10000Pieces
Delivery Time
35-45 Working Days For OEM
Payment
Trade Assurance TT